China PVD Vacuum Coating Machine manufacturer
SHANGHAI ROYAL TECHENOLOGY INC.
PVD protects the environment, saves the blue planet. Royal Technology VACUUM DEPOSITION MACHINE manufacturer. ----Standardization, Precision, Stabilizaiton
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High Abrasion Resistance Black DLC Coating Machine, Deep Black Coatings

High Abrasion Resistance Black DLC Coating Machine, Deep Black Coatings

Brand Name ROYAL
Model Number RTRS
Certification CE
Place of Origin Made in China
Minimum Order Quantity 1 set
Price negotiable
Payment Terms L/C, T/T
Supply Ability 6 sets per month
Delivery Time 12 weeks
Packaging Details Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Chamber Vertical Orientation, 1-door,
Material Stainless Steel 304/316
Vacuum Technology Arc Evaporation+MF Sputtering coating
Deposition Sources Cathodic Arc Sources+ Cylinder sputtering cathodes
Coating Films Ti, Cr, TiN, TiCN, CrC, TiO etc.
Properties harder film, corrosion resistance, abrasion resistance
Detailed Product Description

The RTAS series is an integrated multiple deposition sources machine to general graphite, jet black, blue, copper and bronze colors on metal parts, stainless steel objects. Particularly used for high end class luxury parts.
 

 

Standard Application

Jewelry, watch straps and bodies, Stainless steel sports, Writing instruments

Consumer electronics: Mobile Phone, Laptop, Camera, Drones

  • Home Electronics,
  • In-car Electronics;
  • stainless steel flatware
  • Medical Instrument and Implants

  

 

 

The RTAS machines equipped with circular arc and cylinder sputtering deposition sources. Multiple combinations of DC sputtering, MF sputtering, arc evaporation and Ion source etc. All are available in one single machine, for a high flexibility in configurations to satisfy various applications. Especially for small components aesthetic coatings: jet black, copper, brass and chrome colors.
 

What is MF Sputtering?

Compared with DC and RF sputtering, Mid-Frequency sputtering has become a main thin film sputtering technique for mass production of coating, particularly for the film deposition of dielectric and non-conductive film coatings on surfaces such as optical coatings, solar panels, multiple layers, composite material film etc.

It is replacing RF sputtering due to it operated with kHz rather than MHz for a much faster deposition rate and also can avoid the Target poisoning during compound thin film deposition like DC.

MF sputtering targets always existed with two-sets. Two cathodes are used with an AC current switched back and forth between them which cleans the target surface with each reversal to reduce the charge build up on dielectrics that leads to arcing which can spew droplets into the plasma and prevent uniform thin film growth— which is what we called Target Poisoning.
 

 
 

Technical Specificaitons 

 

No.Name
1Vacuum Pumping System : Turbo Molecular pump + Roots Pump+ Mechanical Pump + Holding Pump
2Vacuum Measuring System: Pirani + Penning Gauges
3Heating System: heaters for substrates heating up to improve the adhesion
4Water/Compressed Air Distribution System: modular design and fabaricated
5Cylinder Sputtering Cathodes: 2/4/6/8 pairs of twins targets for option
6Vacuum Gate Valve ( as option)
7Electrical Enclosure (CE standard)
8Vacuum Chamber (SS304/316L as requested)
9Cathodic Arc Source (conventional arc cathodes )
10View Port ( 2 distributed on the door for inspection inside of deposition chamber )
11Processing Gas Distribution System ( Meter Flow Controller for 4 channels )
12Rack Driving System ( planetary driving model)
13Carousel

 

 

DescriptionRTAS1250RTAS1612
Deposition Chamber (mm)φ1250 * H1250φ1600 * H1250

Planetary Driving

Effective Coating Area (mm)

8: φ270*H850

10: φ230*H850

10: φ300*H850

16: φ200*H850

Circular Arc Cathode (sets)712
Cylinder Sputtering Cathodes (pairs)3 /44 / 6

Pulsed Bias Power

(KW)

3648
DC / MF Sputtering Power (KW)364*36
Arc Power (KW)7*512*5
Vacuum Pumps

2* Turbo Molecular Pumps

1*SV300B

1*WAU1001

1*TRP60

3* Turbo Molecular Pumps

2*SV300B

1*WAU2001

1*TRP90

Max. Power Consumption (KW)200245
Average Power Consumption(KW)<75<100
Operation Space (L*W*H) mm4300*3700*28005000*4000*2800

Flexible configurations: the machine is set according to coating processes and customers’ requirements
 

Insite 

 

 

 

Product Tags: chrome plating machine   glass coating system  
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